首页> 外文会议>International Conference on Simulation of Semiconductor Processes and Devices >Carrier Transport in a Two-Dimensional Topological Insulator Nanoribbon in the Presence of Vacancy Defects.
【24h】

Carrier Transport in a Two-Dimensional Topological Insulator Nanoribbon in the Presence of Vacancy Defects.

机译:存在空位缺陷的二维拓扑绝缘体纳米带中的载流子传输。

获取原文

摘要

We model transport through two-dimensional topological insulator (TI) nanoribbons. To model the quantum transport, we employ the non-equilibrium Green's function approach. With the presented approach, we study the effect of lattice imperfections on the carrier transport. We observe that the topologically protected edge states of TIs are robust against a high percentage (2%) of vacancy defects. We also investigate tunneling of the edge states in two decoupled TI nanoribbons.
机译:我们对通过二维拓扑绝缘体(TI)纳米带的传输进行建模。为了模拟量子传输,我们采用了非平衡格林函数方法。通过提出的方法,我们研究了晶格缺陷对载流子传输的影响。我们观察到,TI的拓扑受保护的边缘状态对于高百分比(2%)的空缺缺陷具有鲁棒性。我们还研究了两个解耦的TI纳米带中边缘状态的隧穿。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号