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首页> 外文期刊>Nature Communications >Ultra-low carrier concentration and surface-dominant transport in antimony-doped Bi2Se3 topological insulator nanoribbons
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Ultra-low carrier concentration and surface-dominant transport in antimony-doped Bi2Se3 topological insulator nanoribbons

机译:掺锑的Bi 2 Se 3 拓扑绝缘子纳米带中的超低载流子浓度和表面主输运

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A topological insulator is the state of quantum matter possessing gapless spin-locking surface states across the bulk band gap, which has created new opportunities from novel electronics to energy conversion. However, the large concentration of bulk residual carriers has been a major challenge for revealing the property of the topological surface state by electron transport measurements. Here we report the surface-state-dominant transport in antimony-doped, zinc oxide-encapsulated Bi2Se3 nanoribbons with suppressed bulk electron concentration. In the nanoribbon with sub-10-nm thickness protected by a zinc oxide layer, we position the Fermi levels of the top and bottom surfaces near the Dirac point by electrostatic gating, achieving extremely low two-dimensional carrier concentration of 2×1011 cm?2. The zinc oxide-capped, antimony-doped Bi2Se3 nanostructures provide an attractive materials platform to study fundamental physics in topological insulators, as well as future applications.. ? 2012 Nature Publishing Group, a division of Macmillan Publishers Limited. All Rights Reserved.
机译:拓扑绝缘体是量子物质的状态,整个体带隙具有无间隙的自旋锁定表面状态,这为从新型电子学到能量转换创造了新的机遇。然而,大量残留载体的高浓度一直是通过电子传输测量揭示拓扑表面态性质的主要挑战。在这里,我们报道了掺杂锑的氧化锌包裹的Bi 2 Se 3 纳米带中的表面态主要输运,其体电子浓度受到抑制。在用氧化锌层保护的厚度小于10 nm的纳米带中,我们通过静电门控将顶表面和底表面的费米能级通过静电门控设置在狄拉克点附近,从而实现了极低的二维载流子浓度2×1011 cm? 2。氧化锌覆盖的,掺杂锑的Bi 2 Se 3 纳米结构为研究拓扑绝缘子的基础物理以及未来的应用提供了一个有吸引力的材料平台。 2012自然出版集团,麦克米伦出版社有限公司的一个部门。版权所有。

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