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首页> 外文期刊>Nature Communications >Ultra-low carrier concentration andsurface-dominant transport in antimony-dopedBi_2se_3 topological insulator nanoribbons
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Ultra-low carrier concentration andsurface-dominant transport in antimony-dopedBi_2se_3 topological insulator nanoribbons

机译:掺锑Bi_2se_3拓扑绝缘子纳米带的超低载流子浓度和表面主导输运

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摘要

A topological insulator is the state of quantum matter possessing gapless spin-locking surfacestates across the bulk band gap, which has created new opportunities from novel electronicsto energy conversion. However, the large concentration of bulk residual carriers has been amajor challenge for revealing the property of the topological surface state by electron transportmeasurements. Here we report the surface-state-dominant transport in antimony-doped, zincoxide-encapsulated Bi_2se_3 nanoribbons with suppressed bulk electron concentration. In thenanoribbon with sub-10-nm thickness protected by a zinc oxide layer, we position the Fermilevels of the top and bottom surfaces near the Dirac point by electrostatic gating, achievingextremely low two-dimensional carrier concentration of 2×1011cm~(-2). The zinc oxide-capped, antimony-doped Bi_2se_3nanostructures provide an attractive materials platform to studyfundamental physics in topological insulators, as well as future applications.
机译:拓扑绝缘体是量子物质的状态,该物质在整个带隙中具有无间隙的自旋锁定表面态,这为从新型电子学到能量转换创造了新的机遇。然而,大量残留载体的高浓度一直是通过电子传输测量揭示拓扑表面态性质的主要挑战。在这里,我们报道了锑电子掺杂的氧化锌封装的Bi_2se_3纳米带中的表面状态占优势的传输,其体电子浓度受到抑制。在厚度小于10nm的氧化锌层保护的纳米带中,我们通过静电门控将顶面和底面的费米能级放置在Dirac点附近,从而实现了极低的二维载流子浓度2×1011cm〜(-2) 。氧化锌覆盖的,掺杂锑的Bi_2se_3纳米结构为研究拓扑绝缘子的基础物理以及未来的应用提供了一个有吸引力的材料平台。

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