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Modeling the Interface Trap Density Influence on Junctionless Nanowire Transistors Behavior

机译:建模界面陷阱密度对无结纳米线晶体管行为的影响

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摘要

This work proposes a methodology for the modeling of the interface traps influence on the electrical characteristics of Junction less Nanowire Transistors. The interface traps can influence the electrical behavior of junction less in both on-and off-states due to the partial depletion regime operation, in which the surface potential varies with the applied biases. The methodology validation is performed using numerical simulations, where the drain current, the trans conductance, the threshold voltage and the subthreshold slope have been analyzed. The modeling considering different traps energetic distributions has been demonstrated.
机译:这项工作提出了一种用于界面陷阱对无结纳米线晶体管电特性影响的建模方法。由于部分耗尽状态的操作,界面陷阱在导通和截止状态下对结的电学行为的影响都较小,在这种情况下,表面电势随施加的偏压而变化。使用数值模拟进行方法论验证,其中已分析了漏极电流,跨导,阈值电压和亚阈值斜率。已经证明了考虑不同陷阱能量分布的建模。

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