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Effect on film properties by phosphorus and sulfur content in electroless Ni-P plating films

机译:化学镀Ni-P膜中磷和硫含量对膜性能的影响

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摘要

In this paper, we have investigated the effect of phosphorus and sulfur content in the electroless Ni-P plating deposits on the film properties. Our results demonstrate that the Ni-P plating films with low phosphorus and no sulfur indicates high solder wettability and high tolerance to embrittlement after heat treatment.
机译:在本文中,我们研究了化学镀Ni-P镀层中磷和硫的含量对薄膜性能的影响。我们的结果表明,低磷且无硫的Ni-P镀膜表明高焊料润湿性和热处理后的耐脆性。

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