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Analysis of AC- gm dispersions due to traps in nitride charge trap layer and generated interface traps in 3-D NAND flash memory cells

机译:分析由于氮化物电荷陷阱层中的陷阱和3-D NAND闪存单元中生成的界面陷阱而导致的AC-gm扩散

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摘要

The AC-gm dispersions are measured to analyze trap profiles in a cell of 3-D NAND flash cell string before and after P/E cycling. After 4k P/E cycling, the trap density (Nt) near the interface between the poly-Si channel and the tunneling oxide is increased according to the extracted Nt profile. The temperature dependency of the AC-gm dispersion is also investigated.
机译:测量AC-gm分散液,以分析P / E循环之前和之后的3-D NAND闪存单元串中的陷阱分布。在4k P / E循环后,根据提取的Nt轮廓,多晶硅通道与隧道氧化物之间的界面附近的陷阱密度(Nt)会增加。还研究了AC-gm分散液的温度依赖性。

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