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Nonparabolicity and confinement effects of IIIV materials in novel transistors

机译:IIIV材料在新型晶体管中的非抛物线效应和约束效应

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Employing a 8 band k.p solver, the self-consistent band structure of the rectangular IIIV nanowires (NW) has been calculated. It is shown that the strong confinement combined with the band nonparabolicity will considerably change the effective masses and the band gap. The mass tensor elements get heavier than the bulk values and improve the density of state (DOS) and centroid capacitance accordingly, while in return the mobility will be degraded. The band widening has also been calculated for different width and height combinations. It is shown that oxide thickness scaling cannot compensate the poor DOS of IIIV, where the silicon device exhibits a continuous performance boost by thinning the oxide layer. Possible improvements of DOS through the width and the mole fraction modulation have been investigated.
机译:使用8波段k.p求解器,已计算出矩形IIIV纳米线(NW)的自洽能带结构。结果表明,强禁闭结合能带非抛物线将大大改变有效质量和能带隙。质量张量元素变得比体积值重,并且相应地提高了状态密度(DOS)和质心电容,而作为回报,迁移率将下降。还针对不同的宽度和高度组合计算了带宽扩展。结果表明,氧化膜厚度定标不能补偿IIIV不良的DOS,因为硅器件通过减薄氧化层而表现出连续的性能提升。已经研究了通过宽度和摩尔分数调制可能改善的DOS。

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