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A new method to calculate intensity distribution in source mask optimization

机译:源掩模优化中计算强度分布的新方法

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We proposed a new method to perform intensity calculation for the Abbe's image model. The method is similar to the decomposition of the transmission cross coefficients (TCC) of the optics system using sum of coherent systems decomposition (SOCS) by SVD. The singular values and kernels are derived efficiently for a pixel-based source. The intensity calculation can be expressed using sum of convolutions between mask and a few kernels and then largely reduce a large amount of convolution computations in the Abbe's image model. This method can be used in the source and mask optimization (SMO) to increase computational efficiency.
机译:我们提出了一种新的方法来对阿贝的图像模型进行强度计算。该方法类似于使用SVD对相干系统分解之和(SOCS)分解光学系统的传输交叉系数(TCC)。对于基于像素的源,有效地导出了奇异值和内核。可以使用蒙版和几个内核之间的卷积之和表示强度计算,然后在阿贝的图像模型中大大减少大量的卷积计算。此方法可以在源和掩码优化(SMO)中使用,以提高计算效率。

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