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On-Wafer high voltage discrete device capacitance characterization for parameter extraction of physically scalable electro-thermal SPICE models

机译:片上高压分立器件电容表征,用于物理可扩展的电热SPICE模型的参数提取

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Accurate characterization of discrete devices such as SuperFET(r), IGBTs and diodes is critical not only for the fine tuning and improvement of production processes, but also for the precise parameter extraction of advanced SPICE models. Among the many measureable parameters, the capacitive properties of a discrete device are of particular importance. In performing on-wafer high voltage capacitance measurements one has to overcome numerous obstacles. In particular CISS (CIES) presents multiple challenges in an on-wafer environment, due to the combination of the extracted gate to source (emitter) and gate to drain (collector) capacitances. In this paper we present the results of on-wafer high voltage measurements performed with a custom made setup. We describe in detail the necessary setup for obtaining highly accurate on-wafer measurements, and compare the results to measurements of packaged devices.
机译:精确表征SuperFET(R),IGBT和二极管等离散装置,不仅仅是对于生产过程的微调和改进,而且还针对先进的香料模型的精确参数提取。在许多可测量的参数中,离散装置的电容性质特别重要。在执行晶圆高压电容测量中,必须克服许多障碍物。特别是CISS(CIE)由于提取的栅极与源极(发射器)和栅极(集电器)电容的栅极的组合而呈现在晶圆环境中的多个挑战。在本文中,我们介绍了使用定制设置执行的晶圆高压测量结果的结果。我们详细描述了获得高度精确的晶圆测量的必要设置,并将结果与​​封装设备的测量进行比较。

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