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17.1 A 0.6V 1.5GHz 84Mb SRAM design in 14nm FinFET CMOS technology

机译:17.1 14NM FinFET CMOS技术的0.6V 1.5GHz 84MB SRAM设计

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The growth of battery-powered mobile and wearable devices has increased the importance of low-power operation and cost in system-on-a-chip (SoC) design. Supply-voltage scaling is the predominant approach to active power reduction for SoC design, including voltage scaling for on-die memory given increasing levels of memory integration. SRAM can limit the minimum operating voltage (V) of a design, often leading to the introduction of separate voltage supplies for on-die memory. Additional supplies increase platform cost, and operating memory at higher voltage leads to increased power consumption. The introduction of trigate devices at the 22nm technology node delivered superior short channel effects and subthreshold slope relative to existing bulk planar device technology enabling reduction in threshold voltage within a fixed leakage constraint. Lower transistor V, improvements to random device variability, and assist circuits to overcome device-size quantization enabled a >150mV reduction in SRAM V [1]. At the 14nm technology node, FinFET device-size quantization remains a challenge for compact 6T SRAM bitcells with minimum-size transistors. Careful co-optimization between technology and design of memory-assist circuits is required in order to deliver dense, low-power memory operation at low voltages. In this paper, we present an 84Mb SRAM array design with wide-voltage-range operation in a 14nm logic technology featuring 2-generation FinFET transistors.
机译:电池供电和可穿戴设备的增长增加了芯片系统(SOC)设计中的低功耗运行和成本的重要性。供应电压缩放是SOC设计的主动功率降低的主要方法,包括用于导通内存的电压缩放给出的内存集成水平。 SRAM可以限制设计的最小工作电压(V),通常导致引入用于导通内存的单独电压供应。额外的用品增加平台成本,并且在较高电压下的操作存储器导致功耗增加。在22NM技术节点处引入Trouge设备,相对于现有的散装平面设备技术,提供了卓越的短信效应和亚阈值斜率,从而降低了固定泄漏约束内的阈值电压。较低的晶体管V,改进随机设备可变性,辅助电路克服设备尺寸量化,SRAM V [1]中的> 150mV减少。在14NM技术节点,FinFET设备尺寸量化仍然是具有最小尺寸晶体管的紧凑型6T SRAM位单元的挑战。需要在低电压下提供致密,低功耗的存储器操作来仔细协调技术和设计的设计和设计。在本文中,我们在14nm逻辑技术中介绍了84MB SRAM阵列设计,具有2代FinFET晶体管的14nm逻辑技术。

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