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Investigation and optimization of monolithic 3D logic circuits and SRAM cells considering interlayer coupling

机译:考虑层间耦合的单片3D逻辑电路和SRAM单元的研究和优化

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In this work, we comprehensively investigate the impact of interlayer coupling on monolithic 3D logic circuits and 6T SRAM cells using TCAD mixed-mode simulations. In addition to reduced interconnection length, monolithic 3D integration enables further performance enhancements with optimal layout. Our study indicates that minimum leakage, equivalent to the planar 2D circuits with dual reverse body biases, is achievable for circuits stacked in 3D fashion. Moreover, stacking NFET layer over the PFET tier facilitates larger design margins for SRAM cell stability and performance.
机译:在这项工作中,我们使用TCAD混合模式仿真全面研究了层间耦合对单片3D逻辑电路和6T SRAM单元的影响。除了缩短互连长度之外,单片3D集成还可以通过优化布局进一步提高性能。我们的研究表明,对于以3D方式堆叠的电路,可以实现最小泄漏,相当于具有双重反向本体偏置的平面2D电路。此外,在PFET层上堆叠NFET层有助于提高SRAM单元稳定性和性能的设计余量。

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