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Photoelectrochemical cell performance of electrodeposited iron doped zinc selenide thin film

机译:电沉积铁掺杂硒化锌薄膜的光电化学电池性能

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In the present investigation, we are discussing the results on photoelectrochemical cell performance of iron doped zinc selenide thin films by Electrodeposition. Thin films were deposited by Galvanostatically as well as potentiostatically at an aqueous solution onto stainless steel substrate as well as ITO (indium tin oxide). Precursor of zinc selenide is zinc sulphate (ZnSO4), selenium dioxide (SeO2) and ferrous sulphate (FeSO4). The deposited films were characterized by different physico-chemical characterization such as, for structural study X-ray diffraction study was used, Scanning electron microscopy (SEM) for surface morphology, optical absorption study made by UV spectrometer and it showed that the semiconductor nature of the electrodeposited zinc selenide thin films with band gap 2.6 eV and PEC performance shows that Isc is 360 mA and Voc is 135 mV.
机译:在本研究中,我们正在讨论通过电沉积对铁掺杂硒化锌薄膜的光电化学电池性能的结果。通过恒电位和恒电位在水溶液中将薄膜沉积在不锈钢基板以及ITO(铟锡氧化物)上。硒化锌的前体是硫酸锌(ZnSO4),二氧化硒(SeO2)和硫酸亚铁(FeSO4)。通过不同的理化性质对沉积膜进行表征,如用于结构研究的X射线衍射研究,用于表面形貌的扫描电子显微镜(SEM),紫外光谱仪进行的光吸收研究,表明膜的半导体性质。带隙为2.6 eV的电沉积硒化锌薄膜和PEC性能显示Isc为360 mA,Voc为135 mV。

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