Rotary Spatial Plasma Enhanced Atomic Layer Deposition — An enabling manufacturing technology for μm-thick ALD films

摘要

Atomic Layer Deposition (ALD) is well known for its high film quality and high conformality, but limited by the low deposition rate. Beneq proposes a novel approach using Rotary Spatial Plasma Enhanced ALD process, which can reach deposition rates 10× higher than traditional pulsed ALD. This technology also enables use of PEALD in batch mode with high throughput. This paper describes the technology in more details.