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Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition

机译：中空阴极等离子体电子源通过电子增强原子层沉积进行低温沉积钴膜

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Zachary C. Sobell; Andrew S. Cavanagh; David R. Boris; Scott G. Walton; Steven M. George;
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1. Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and Al_xGa_(1-x)N thin films at low temperatures [J] . Cagla Ozgit-Akgun, Eda Goldenberg, Ali Kemal Okyay Journal of Materials Chemistry, C. materials for optical and electronic devices . 2014,第12期

机译：在低温下空心阴极等离子体辅助原子层沉积晶体AlN，GaN和Al_xGa_（1-x）N薄膜
2. Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition [J] . Haider Ali, Kizir Seda, Ozgit-Akgun Cagla, Journal of Materials Chemistry, C. materials for optical and electronic devices . 2015,第37期

机译：空心阴极等离子体辅助原子层沉积低温生长纤锌矿InxGa1-xN薄膜
3. Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels [J] . S. Bolat, C. Ozgit-Akgun, B. Tekcan, Applied Physics Letters . 2014,第24期

机译：具有基于空心阴极等离子体辅助原子层沉积的GaN沟道的低温薄膜晶体管
4. Hollow-cathode plasma-assisted atomic layer deposition: A novel route for low-temperature synthesis of crystalline III-nitride thin films and nanostructures [C] . Biyikli Necmi, Ozgit-Akgun Cagla, Goldenberg Eda, Institute of Electrical and Electronics Engineers International Conference on Electronics and Nanotechnology . 2015

机译：中空阴极等离子体辅助原子层沉积：低温合成III族氮化物晶体薄膜和纳米结构的新途径
5. Plasma Enhanced Atomic Layer Deposition of Cooper Seed Layers at Low Process Temperatures. [D] . Mao, Jiajun. 2012

机译：低工艺温度下库珀种子层的等离子体增强原子层沉积。
6. Structural Optical and Electrical Properties of HfO2 Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition [O] . Kyoung-Mun Kim, Jin Sub Jang, Soon-Gil Yoon, 2020

机译：等离子体增强原子层沉积在低温下沉积的HfO2薄膜的结构光学和电学性质
7. Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures [O] . Ozgit-Akgun C., Goldenberg E., Okyay A.K., Biyikli N. 2014

机译：在低温下对晶体AlN，GaN和AlxGa1-xN薄膜进行空心阴极等离子体辅助原子层沉积
8. Development of Low-Temperature Deposition Processes by Atomic Layer Epitaxy for Binary and Ternary Oxide Thin Films [R] . Putkonen, M. 2002

机译：二元和三元氧化物薄膜原子层外延低温沉积过程的研究

Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition

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