A new VOx thin film for uncooled infrared focal plane arrays

摘要

In this paper, a new VOx thin film for uncooled infrared focal plane arrays is proposed. The proposed VOx thin film is fabricated with a magnetron sputtering method and has particular optical properties for infrared wavelength. The fabricating technology of the VOx thin film has low-temperature characteristics and is completely compatible with the fabricating process of CMOS integrated circuits for uncooled infrared focal plane array. Experimentally measured results indicate that the fabricated VOx thin film is potential to be applied as optical detecting materials for medium-wavelength infrared (MWIR) and long-wavelength infrared (LWIR).