Study on the energy structure of amorphous antireflection Er_2O_3 films on Si(001) substrates

摘要

Er_2O_3 films were deposited on Si(001) substrates by radio frequency magnetron technique. X-ray photoelectron spectroscopy, x-ray diffraction and atomic force microscopy show the Er_2O_3 films obtained are stoichiometric, amorphous, and uniform. The electronic structure is studied which shows a large energy gap value of the Er_2O_3 film, indicating Er_2O_3 film could be a promising antireflection coating for solar cells.