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Benchmarking of Thermal Boundary Resistance of GaN-SiC Interfaces for AlGaN/GaN HEMTs: US, European and Japanese Suppliers

机译:AlGaN / GaN HEMT的GaN-SiC接口热边界电阻基准测试:美国,欧洲和日本供应商

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Benchmarking of thermal boundary resistance (TBR) of GaN-SiC interfaces for AlGaN/GaN HEMTs on SiC substrates is reported. Thermal resistance at this interface results in an additional sizable device temperature rise, and therefore reduced device reliability, beyond what is expected just from the thermal conductivities of the device materials. We demonstrate here that there is a large difference in GaN-SiC TBR, up to a factor of two, between different suppliers. Device structures from leading US, European, and Japanese suppliers were assessed, from commercial suppliers, universities and research institutes.
机译:报道了在SiC衬底上用于AlGaN / GaN HEMT的GaN-SiC界面的热边界电阻(TBR)的基准测试。在此界面处的热阻导致额外的相当大的器件温度升高,从而降低了器件的可靠性,超出了仅由器件材料的导热率所预期的范围。我们在这里证明,不同供应商之间的GaN-SiC TBR之间存在很大差异,最大到两倍。评估了来自美国,欧洲和日本领先供应商的设备结构,这些供应商来自商业供应商,大学和研究机构。

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