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Uniformity of Epitaxial Graphene on On-axis and Off-axis SiC Probed by Raman Spectroscopy and Nanoscale Current Mapping

机译:拉曼光谱和纳米级电流映射探测外延石墨烯在轴上和轴外SiC上的均匀性

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Epitaxial graphene was grown on the surface of on-axis and off-axis SiC (0001) by solid state graphitization at high temperatures (2000 °C) in Ar ambient. The effect of the miscut angle on the lateral uniformity of the few layers of graphene (FLG) was investigated by combined application of micro-Raman spectroscopy and Torsion Resonance Conductive Atomic Force Microscopy, the latter method enabling a quantification of the FLG coverage on SiC with submicrometer lateral resolution. While the on-axis samples result in uniform coverage by thin (~ 3 monolayers) FLG, the coverage for off-axis samples is much less uniform, following closely the step bunching morphology of the SiC surface.
机译:外延石墨烯通过在Ar环境中的高温(2000°C)下进行固态石墨化而在同轴和离轴SiC(0001)的表面上生长。通过结合显微拉曼光谱和扭转共振导电原子力显微镜研究了错切角对石墨烯(FLG)几层横向均匀性的影响,后一种方法可以定量分析SiC上的FLG覆盖率。亚微米横向分辨率。同轴样品通过薄(〜3个单层)FLG导致均匀的覆盖,而离轴样品的覆盖则非常不均匀,这与SiC表面的紧密束聚形态密切相关。

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