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Optical reflectometry and ellipsometry measurements of graphene and thin graphitic films on bulk low-index substrates

机译:低密度块状基材上石墨烯和石墨薄膜的光学反射法和椭圆偏振法测量

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Optical reflectometry and ellipsometry measurements are taken on graphene layers on a variety of bulk substrates using visible light sources. Using a universal optical conductance model allows accurate determination of layer number. Extension of reflectometry to ellipsometry has the potential to probe anisotropy in optical conductance, and is expected to be useful for graphene sample and device characterization for transparent graphene electrode technology.
机译:使用可见光源在各种块状基底上的石墨烯层上进行光学反射法和椭圆偏振法测量。使用通用的电导模型可以精确确定层数。将反射法扩展到椭圆法具有探测光学电导各向异性的潜力,并且有望用于透明石墨烯电极技术的石墨烯样品和器件表征。

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