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An anomalous correlation between gate leakage current and threshold voltage fluctuation in advanced MOSFETs

机译:先进MOSFET的栅极泄漏电流与阈值电压波动之间的反常关系

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摘要

An anomalous correlation of gate leakage current and threshold voltage fluctuation in aggressively scaled MOSFETs is revealed and analyzed by statistical technique and a corresponding physical model is proposed. For a range of threshold voltage (Vt) design, gate leakage at fixed gate and drain bias increases with Vt before it decreases at higher Vt. The behavior can be accurately explained by a trade-off between two mechanisms (“two reversed functions”): Vt roll-off effect and gate leakage current density dependence on surface potential.
机译:通过统计技术揭示并分析了积极规模化MOSFET的栅极泄漏电流与阈值电压波动之间的反常关系,并提出了相应的物理模型。对于一定范围的阈值电压(V t )设计,固定栅极和漏极偏置处的栅极泄漏随V t 的增加而增大,然后在较高的V t 减小inf>。可以通过在两种机制(“两个反向函数”)之间进行权衡来准确地解释这种行为:V t 滚降效应和栅极泄漏电流密度对表面电势的依赖性。

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