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Boron Doping of Microcrystalline and Nanocrystalline Diamond Films: Where is the Boron Going?

机译:微晶和纳米晶金刚石薄膜的硼掺杂:硼在哪里?

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We present data showing how the electrical conductivity and Raman spectra of boron doped 'cauliflower'-type nanocrystalline (c-NCD) CVD diamond films vary as a function of B content. The conductivity is roughly linear as a function of B content between an onset threshold of ~5×10~(20) cm~(-3) up to ~6 ×10~(21) cm~(-3), with the higher concentrations giving near metallic conductivity values. The onset threshold may be due to compensating donors due to the large number of impurities and defects in these films. The position of the Lorentzian contribution to the 500 cm~(-1) Raman feature was used to estimate the B content and compared to the value measured using SIMS. We found that the Raman method overestimated the concentration of B by a factor of ~5 for these c-NCD films. The shortfall may be explained if only a small fraction of the B found in the small-grained films is being incorporated into substitutional sites. We conclude that in diamond films with a high concentration of grain boundaries, the majority of the B (80% in some cases) must be present at or in the grain boundaries.
机译:我们提供的数据显示了硼掺杂的“花椰菜”型纳米晶体(c-NCD)CVD金刚石薄膜的电导率和拉曼光谱如何随B含量的变化而变化。电导率随B含量的变化在大约5×10〜(20)cm〜(-3)的起始阈值至大约6×10〜(21)cm〜(-3)的范围内呈线性关系,其中较高给出接近金属电导率值的浓度。起始阈值可能是由于这些薄膜中存在大量杂质和缺陷而补偿了供体。将洛伦兹贡献对500 cm〜(-1)拉曼特征的位置用于估算B含量,并将其与使用SIMS测量的值进行比较。我们发现,对于这些c-NCD膜,拉曼方法将B的浓度高估了约5倍。如果仅将小颗粒薄膜中发现的B的一小部分掺入替代位点,则可以解释这种不足。我们得出的结论是,在具有高晶界浓度的金刚石膜中,大多数B(在某些情况下为80%)必须存在于晶界处或晶界中。

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