首页> 外文会议>2006 BIMW >Visible-blind Metal-semiconductor-Metal Structured Deep-ultraviolet Photodetectors Using Single-Crystalline Diamond Thin Film
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Visible-blind Metal-semiconductor-Metal Structured Deep-ultraviolet Photodetectors Using Single-Crystalline Diamond Thin Film

机译:使用单晶金刚石薄膜的可见盲金属半导体金属结构深紫外光电探测器

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Metal-semiconductor-metal (MSM) planar photodiodes and photoconductors were fabricated on unintentionally doped homoepitaxial diamond thin films deposited on Ib and IIa-type diamond substrated. The MSM photoconductor on the epilayer grown on the Ib-type substrate exhibits the highest discrimination ratio up to 10~8 between 210 nm and visible light and a photocurrent gain around 33 at 220 nm. The persistent photoconductivity is rather week for such kind of photoconductor.
机译:金属-半导体-金属(MSM)平面光电二极管和光电导体是在无意掺杂的同质外延金刚石薄膜上沉积的,该薄膜沉积在Ib和IIa型金刚石衬底上。在Ib型衬底上生长的外延层上的MSM光电导体在210 nm和可见光之间表现出最高的分辨比,最高可达10〜8,在220 nm处的光电流增益约为33。对于这种类型的光电导体而言,持久的光电导性相当高。

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