首页> 外国专利> Device structure for field emission display using doped pseudo diamond and amorphous diamond thin film and method for manufacturing same

Device structure for field emission display using doped pseudo diamond and amorphous diamond thin film and method for manufacturing same

机译:使用掺杂的伪金刚石和非晶金刚石薄膜进行场发射显示的装置结构及其制造方法

摘要

The present invention relates to a fabrication method and a structure in a tip application, which is a core element for FED, using a polycrystalline diamond or an amorphous diamond thin film formed by crystallizing a DLC thin film by a doped DLC thin film and a laser. DLC thin films are ideal for FED tip devices due to their high resistivity, chemical inertness, rigidity and low work function. DLC thin films can be grown at low temperatures and produced in large areas by various methods. Doped DLC thin films can be applied to simple diode type and gray type for FED tip application. The crystallization of the doped DLC thin film by excimer laser is more polycrystalline than the amorphous phase in the thin film, so that the driving voltage can be further lowered when applied to the tip of the FED. In addition, since the laser annealing is performed after doping using an ion shower device without a mass separation device, a large-area process is possible to increase productivity.
机译:本发明涉及尖端应用中的制造方法和结构,该尖端应用是用于FED的核心元件,其使用通过掺杂DLC薄膜和激光使DLC薄膜结晶而形成的多晶金刚石或非晶金刚石薄膜。 。 DLC薄膜具有高电阻率,化学惰性,刚性和低功函数,因此是FED尖端设备的理想之选。 DLC薄膜可以在低温下生长,并可以通过各种方法大面积生产。掺杂的DLC薄膜可应用于简单二极管类型和灰色类型,以用于FED尖端应用。准分子激光使掺杂的DLC薄膜的结晶比薄膜中的非晶相多晶,因此当施加到FED的尖端时,驱动电压可以进一步降低。另外,由于在使用没有质量分离装置的离子喷淋装置进行掺杂之后进行激光退火,所以大面积处理可以提高生产率。

著录项

  • 公开/公告号KR970013400A

    专利类型

  • 公开/公告日1997-03-29

    原文格式PDF

  • 申请/专利权人 장진;

    申请/专利号KR19950028154

  • 发明设计人 장진;전수철;

    申请日1995-08-31

  • 分类号H01L29/00;

  • 国家 KR

  • 入库时间 2022-08-22 03:18:02

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