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Low-cost Amorphous Diamond Films for Efficient Field Emission Displays

机译:用于高效场发射显示器的低成本非晶金刚石薄膜

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In this paper, we describe the novel use of amorphous diamond (diamond-like carbon) films for electron field emission. These films have the potential of exhibiting superior electrical, mechanical, manufacturing, and integration characteristics over other candidate materials such as carbon nanotubes (CNTs) for use as field emission display (FED) substrates. Amorphous diamond films exhibit very efficient electron emission characteristics based on the nano-scale combination of crystalline diamond (sp3) and graphitic (sp2) bonding to form a highly-entropic, nano-composite. Thus, amorphous diamond represents a unique class of material, combining the properties of an electrically conducting material (graphite) and insulator (diamond) to form a material that exhibits various intermediate atomic energy states between the forbidden band gap. These intermediate energy states allow electrons to climb the energy ladder and emit into free space with the application of a small bias voltage. Furthermore, the natural formation of nano-scale, high-aspect ratio asperities also significantly enhances field emission characteristics. It is possible to deposit high-densities (4 × 1010 emitters/cm2) of these nano-sized emitters using well-characterized physical vapor deposition (PVD) techniques such as cathodic arc. This type of manufacturing process is very low cost and allows the substrate to be deposited over large areas. In addition, the manufacturing process is highly amenable for the integration of these field-emitting films with underlying electronics/semiconductor substrates. Various studies have shown that these films are very mechanically robust and exhibit high emission reproducibility across wide operating conditions. Given all these advantages, amorphous diamond films may represent an answer to many of the problems associated with CNT-based FED technologies that are current being investigated.
机译:在本文中,我们描述了非晶态金刚石(类金刚石碳)薄膜在电子场发射中的新颖用途。与用作场发射显示器(FED)基板的其他候选材料(例如碳纳米管(CNT))相比,这些膜具有展现出优异的电气,机械,制造和集成特性的潜力。非晶金刚石膜基于结晶金刚石(sp3)和石墨(sp2)结合形成高熵的纳米复合材料的纳米级组合,表现出非常有效的电子发射特性。因此,无定形金刚石代表了独特的材料类别,结合了导电材料(石墨)和绝缘体(金刚石)的特性,形成了在禁带隙之间表现出各种中间原子能态的材料。这些中间能态使电子在施加小的偏置电压的情况下爬上能量梯,并发射到自由空间中。此外,自然形成的纳米级,高纵横比的凹凸也显着增强了场发射特性。使用众所周知的物理气相沉积(PVD)技术(例如阴极电弧),可以沉积这些纳米级发射器的高密度(4×1010个发射器/ cm2)。这种类型的制造过程的成本非常低,并且可以在大面积上沉积基板。此外,制造工艺非常适合将这些场致发射膜与下面的电子/半导体衬底集成在一起。各种研究表明,这些薄膜具有非常强的机械强度,并且在宽泛的工作条件下均显示出高发射再现性。鉴于所有这些优点,无定形钻石膜可能代表了与目前正在研究的与基于CNT的FED技术相关的许多问题的答案。

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