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Gate Sinking Effect of 0. 1 ;C;m InP HEMT MMICs Using Pt/Ti/Pt/Au

机译:使用Pt / Ti / Pt / Au的0. 1; C; m InP HEMT MMIC的栅极下沉效应

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Gate sinking effect of 0.1 mum InAlAs/InGaAs/InP HEMT MMICs (with Pt/Ti/Pt/Au gate metals) subjected to elevated temperature lifetests has been investigated. The results show that Pt sinking is the dominant degradation mechanism caused by Pt diffusing into the In0.52Al0.4As Schottky barrier layer. Pt sinking explains the observed evolutions of Schottky diodes, Ids-Gm transfer characteristics, and the S21 increase. Scanning-transmission-electron-microscope micrographs substantiate the alleviation of Schottky junction degradation of InP HEMTs using Pt/Ti/Pt/Au gates. Moreover, 2-temperature lifetest shows that the activation energy is approximately 1.55 eV, based on a failure criterion of DeltaIDSS = -20%. The results from this study demonstrate that Pt sinking is the primary degradation mechanism of 0.1 mum InP HEMT MMICs with Pt/Ti/Pt/Au gate metals
机译:研究了0.1微米InAlAs / InGaAs / InP HEMT MMIC(含Pt / Ti / Pt / Au栅极金属)的栅极沉没效应,并进行了高温寿命测试。结果表明,Pt下沉是Pt扩散到In 0.52 Al 0.4 As肖特基势垒层中的主要降解机理。 Pt下沉解释了观察到的肖特基二极管的演变,Ids-Gm传输特性以及S21的增加。扫描透射电子显微镜显微照片证实了使用Pt / Ti / Pt / Au门缓解了InP HEMT的肖特基结降解。此外,根据DeltaI DSS = -20%的失效准则,2温度寿命测试显示活化能约为1.55 eV。这项研究的结果表明,Pt下沉是具有Pt / Ti / Pt / Au栅金属的0.1微米InP HEMT MMIC的主要降解机理。

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