首页> 外文会议>Device Research Conference, 2004. 62nd DRC. Conference Digest Includes 'Late News Papers' volume >Velocity overshoot effects and transit times in III-V nitride HFETs : a Monte Carlo study
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Velocity overshoot effects and transit times in III-V nitride HFETs : a Monte Carlo study

机译:Ⅲ-Ⅴ族氮化物HFET中的速度过冲效应和过渡时间:蒙特卡洛研究

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Monte Carlo simulation of AlGaN/GaN HEMTs were carried out and compared with GaAs based devices. The following outcomes of our simulations are noteworthy: i) partially due to the relatively heavy electron effective mass in GaN, the velocities of the electrons are mostly below the steady state values through most of the channel; ii) unlike what is observed in GaAs based short channel devices, there is no pronounced overshoot effect, even at high drain source biases, due to increased scattering; iii) our simulations show that the suppression of overshoot is directly related to the length of the high field region. This length is quite small for usual bias conditions. We suggest that a non-uniform composition of the barrier region could conceivably help in spreading out the high field region, which is present at the drain end of the device. Other results of the Monte Carlo simulation include transconductance, noise information and unity current gain frequency.
机译:进行了AlGaN / GaN HEMT的蒙特卡罗模拟,并与基于GaAs的器件进行了比较。我们的模拟的以下结果值得关注:i)部分由于GaN中相对较高的电子有效质量,在大多数通道中,电子的速度大多低于稳态值; ii)与在基于GaAs的短通道器件中观察到的情况不同,由于散射增加,即使在高漏极源极偏置下也没有明显的过冲效应; iii)我们的仿真表明,对过冲的抑制与高场区域的长度直接相关。对于通常的偏置条件,该长度很小。我们认为,势垒区域的不均匀组成可以想象地有助于扩展存在于器件漏极端的高场区域。蒙特卡洛模拟的其他结果包括跨导,噪声信息和单位电流增益频率。

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