首页> 外文会议>Device Research Conference, 2004. 62nd DRC. Conference Digest Includes 'Late News Papers' volume >Tunneling and depletion-mode TFTs fabricated by low-temperature stress-assisted Cu-induced lateral growth and metal-free crystallization of germanium
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Tunneling and depletion-mode TFTs fabricated by low-temperature stress-assisted Cu-induced lateral growth and metal-free crystallization of germanium

机译:低温应力辅助Cu诱导的横向生长和锗的无金属结晶制造的隧穿和耗尽型TFT

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Tunneling and depletion-mode poly-Ge TFTs were fabricated at temperatures as low as 150/spl deg/C and 200/spl deg/C respectively. Fabrication of the tunneling TFTs was based on stress-assisted lateral growth of Ge from Cu-seeded islands. In a different approach, depletion-mode TFTs were fabricated, based on metal-free crystallization of Ge by successive steps of hydrogenation and annealing.
机译:分别在低至150 / spl deg / C和200 / spl deg / C的温度下制造隧穿和耗尽型多晶硅TFT。隧穿TFT的制造基于应力辅助下Cu籽晶岛中Ge的横向生长。以不同的方式,通过连续的氢化和退火步骤,基于Ge的无金属结晶,制造了耗尽型TFT。

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