首页> 外文会议>Device Research Conference, 2004. 62nd DRC. Conference Digest Includes 'Late News Papers' volume >Influence of the access resistance in the rf performance of mm-wave AlGaN/GaN HEMTs
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Influence of the access resistance in the rf performance of mm-wave AlGaN/GaN HEMTs

机译:接入电阻对毫米波AlGaN / GaN HEMT射频性能的影响

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After demonstrating impressive performance in the X-band frequencies, one of the next goals for GaN-based power transistors is to increase the frequency of operation to the mm-wave range. Monte Carlo simulations predict that the saturation electron velocity in AlGaN/GaN high electron mobility transistors (HEMTs) should be around 2.5/spl times/10/sup 7/ cm/s (M. Singh and J. Singh, J. Appl. Phys. vol. 94, p. 2498, 2003). The study of f/sub T/ vs I/sub DS/ from pinch-off to saturation is a very useful tool to understand the maximum frequency performance of mm-wave HEMTs. In this work, we have studied the effect of parasitic resistances in the shape of the f/sub T/ vs I/sub DS/ curve. R/sub s/ increases with the current density in the channel. The extraction of the effect of the differential access resistance out of f/sub T/ greatly changes the shape of the curve. The access resistances play an important role in the rf behavior of AlGaN/GaN transistors. Not only the absolute values, but also their increase with current must be controlled in order to get the maximum performance out of the GaN-based HEMTs.
机译:在X波段频率中展示令人印象深刻的性能之后,GaN基功率晶体管的下一个目标之一是将操作频率提高到MM波范围。蒙特卡罗模拟预测AlGaN / GaN高电子迁移率(HEMT)中的饱和电子速度应约为2.5 / SPL时/ 10 / SUP 7 / CM / S(M.Singh和J.Singh,J.Phing。Phys 。Vol.94,p。2498,2003)。 F / SUB T / VS I / SUB DS /从夹紧到饱和度的研究是一个非常有用的工具,以了解MM波HEMT的最大频率性能。在这项工作中,我们研究了寄生电阻在F / SUM T / VS I / SUB DS /曲线形状的影响。 r / sub s /随着通道中的电流密度增加。提取F / sum T /大大改变曲线的形状的差分进出电阻的效果。访问电阻在AlGaN / GaN晶体管的RF行为中起重要作用。不仅可以控制绝对值,还可以控制它们的电流的增加,以便从基于GaN的HEMTS中获得最大性能。

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