首页> 外文会议>Electron Devices Meeting, 2001. IEDM Technical Digest. International >Highly reliable 1 Mbit ferroelectric memories with newly developed BLT thin films and steady integration schemes
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Highly reliable 1 Mbit ferroelectric memories with newly developed BLT thin films and steady integration schemes

机译:具有最新开发的BLT薄膜和稳定集成方案的高度可靠的1 Mbit铁电存储器

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Highly reliable packaged 1 Mbit ferroelectric memories with 0.35 /spl mu/m CMOS ensuring ten-year retention and imprint at 175/spl deg/C have been successfully developed for the first time. These excellent reliabilities have resulted from newly developed BLT ferroelectric films with superior performance and steady integration schemes free from attacks of process impurities.
机译:具有0.35 / spl mu / m CMOS的高度可靠的封装1 Mbit铁电存储器确保了在175 / spl deg / C的十年保留率和压印率已首次成功开发。这些优异的可靠性源于新开发的BLT铁电薄膜,这些薄膜具有卓越的性能和稳定的集成方案,且不会受到工艺杂质的侵蚀。

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