Measuring the effects of sub 0.1 mu m filtration of 248nm photoresist performance

摘要

Photolithography is a key technology driver enabling next generation processes. As line widths decrease to 0.18 mu m and bleow, the critical size of particulate contamination decreases proprortionately. The implementation of filtration below 0.1 mu m within existing dispense systems raises concern as the removal rating of the filter approaches the size of large molecular weight components of the photoresist.