首页> 外文会议>Electron Devices Meeting, 1999. IEDM Technical Digest. International >A low-distortion and high-efficiency E-mode GaAs power FET based on a new method to improve device linearity focused on g/sub m/ value
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A low-distortion and high-efficiency E-mode GaAs power FET based on a new method to improve device linearity focused on g/sub m/ value

机译:基于改善器件线性度的新方法的低失真高效E型GaAs功率FET,专注于g / sub m /值

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In this paper we propose a new method to improve linearity of GaAs power FETs. Based on a Volterra series analysis, the 3rd order intermodulation distortion (IM3) ratio was found to be proportional to g/sub m//sup -2/ when output power P/sub out/ is fixed. Increasing g/sub m/ is hence a very effective method to improve IM3. To enlarge g/sub m/ while keeping the breakdown voltage high, two possible ways are considered for our GaAs power FET. One way is to thin the AlGaAs barrier layer. The other is to increase donor density in the n-GaAs channel layer and to thin the channel layer simultaneously. Since either way gives rise to an increase in the threshold voltage, one of the embodiments of the new method is an E-mode FET. An E-mode GaAs power FET based on the new method exhibited an IM3 ratio of -36 dBc and a power added efficiency (PAE) of 35% at an average P/sub out/ of 47 dBm and a frequency of 2.2 GHz. The IM3 ratio and the PAE achieved are 8 dB better and 10% higher than those of the prior work.
机译:在本文中,我们提出了一种新的方法来改善GaAs功率FET的线性度。基于Volterra级数分析,当输出功率P / sub out /固定时,三阶互调失真(IM3)比与g / sub m // sup -2 /成正比。因此,增加g / sub m /是提高IM3的非常有效的方法。为了在保持较高击穿电压的同时增大g / sub m /,我们的GaAs功率FET考虑了两种可能的方法。一种方法是使AlGaAs阻挡层变薄。另一个是增加n-GaAs沟道层中的施主密度并同时使沟道层变薄。由于任一种方式都会引起阈值电压的增加,因此新方法的实施例之一是E模式FET。基于新方法的E模式GaAs功率FET的IM3比为-36 dBc,平均P / sub out /为47 dBm,频率为2.2 GHz,功率附加效率(PAE)为35%。与以前的工作相比,IM3比和PAE分别提高了8 dB和10%。

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