A measurement system for static and dynamic characterization of silicon micromachines was developed. The computer- controlled system, using a HeNe-laser at 633 nm and a two- dimensional position sensor, allows simultaneous measurements of optical beam motion on two axes. To demonstrate the flexibility and functionality of the setup, measurements on various polysilicon surface-micromachined mirrors were performed. These measurements included tilt-angle versus driving-voltage curves, frequency responses, and motion perpendicular to the primary scan axis.
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