首页> 外文会议>Indium Phosphide and Related Materials, 1998 International Conference on >Selective-area MOCVD growth for novel 1.3 /spl mu/m DFB laser diodes with graded grating
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Selective-area MOCVD growth for novel 1.3 /spl mu/m DFB laser diodes with graded grating

机译:带有梯度光栅的新型1.3 / splμ/ m DFB激光二极管的选择性区域MOCVD生长

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摘要

We demonstrate a new approach to realize the graded grating, which is effective to improve the modulation characteristics of DFB laser diodes (LDs) for analog optical transmission, by using selective-area-growth (SAG) technique. Ideal parabolic thickness profile and the thickness enhancement ratio as high as 4.6 in the grating layer have been realized by optimizing the mask shape using the simulation technique for SAG. We have also successfully realized the high light-current linearity in 1.3 /spl mu/m DFB-LDs with graded grating for the first time. It has been shown that the LDs have excellent distortion characteristics.
机译:我们演示了一种新的方法来实现渐变光栅,该方法可通过使用选择性区域增长(SAG)技术有效地改善用于模拟光传输的DFB激光二极管(LD)的调制特性。通过使用SAG的模拟技术优化掩模形状,已经实现了理想的抛物线厚度轮廓和高达4.6的光栅层厚度增强比。我们还首次成功地在具有渐变光栅的1.3 / spl mu / m DFB-LD中实现了高光电流线性度。已经表明,LD具有优异的失真特性。

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