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Selective-area MOCVD growth for novel 1.3 /spl mu/m DFB laser diodes with graded grating

机译:用于新型1.3 / SPL MU / M DFB激光二极管的选择性 - 区域MOCVD增长,具有分级光栅

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摘要

We demonstrate a new approach to realize the graded grating, which is effective to improve the modulation characteristics of DFB laser diodes (LDs) for analog optical transmission, by using selective-area-growth (SAG) technique. Ideal parabolic thickness profile and the thickness enhancement ratio as high as 4.6 in the grating layer have been realized by optimizing the mask shape using the simulation technique for SAG. We have also successfully realized the high light-current linearity in 1.3 /spl mu/m DFB-LDs with graded grating for the first time. It has been shown that the LDs have excellent distortion characteristics.
机译:我们展示了实现渐变光栅的新方法,这是通过使用选择性区域生长(SAG)技术来改善模拟光学传输的DFB激光二极管(LDS)的调制特性。通过使用落下技术优化掩模形状,实现了光栅层中的理想抛物厚度曲线和高达4.6的厚度增强比。我们还成功地实现了在1.3 / SPL MU / M DFB-LD中的高光电流线性,第一次具有分级光栅。已经表明,LD具有优异的失真特性。

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