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E-beam lithography: an efficient tool for the fabrication of diffractive and micro-optical elements

机译:电子束光刻:一种制造衍射和微光学元件的有效工具

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Abstract: The fabrication of surface profiles for microoptical and micromechanical devices becomes more and more important. Especially the high accuracy necessary for the realization of the functional components benefits from the use of e-beam lithography, either for the fabrication of tools for optical lithography and replication techniques or for the direct writing of the pattern. After a classification of the pattern and an introduction into the processes for the realization of surface structures we show examples for the basic structure classes as well as for the integration of several properties within one profile resulting in elements with higher complexity. !10
机译:摘要:微光学和微机械设备的表面型材的制造变得越来越重要。特别是从使用电子束光刻来实现功能部件所需的高精度,用于制造用于光学光刻和复制技术的工具或用于图案的直接写入。在图案的分类和进入过程中实现表面结构的过程之后,我们示出了基本结构类的示例,以及在一个轮廓内的几个属性的集成导致具有更高复杂性的元素。 !10

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