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Space-charge-limited currents in n-i-n devices ncorporating glow-discharge and hot-wire deposited a-Si:H

机译:N-I-N器件中的空间电荷限制电流Ncorplating辉光 - 放电和热线沉积A-Si:H.

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Space-charge-limited currents have been examined in a wide variety of n-i-n devices.If the devices were completely symmetric, the current-voltage characteristics would be identical for positive and negative bias,but in several devices differences between the two polarities were observed.In order to understand in which part of the device these differences originate,the influence of the contacts and interfaces on the JV characteristics were examined by using different metla top contacts,different n-layersand different i-layers.Ag and AL top contacts gave minor differences between the polarities,whereas with Cr contacts no differences were observed.Incorporation of a defect layer in the i-layer results in asymmetric JV curves.We have observed a small asymmetry in an experimental device, and a large asymmetry using AMPS modeling.N-i-n devices appear to be a sensitive probe for interface defects.
机译:已经在各种NIN设备中检查了空间电荷限制。如果设备完全对称,则电流电压特性对于正极和负偏差是相同的,但在几个设备中观察到两个极性之间的差异。为了理解在这些差异起源的哪个部分起源,通过使用不同的Metla顶部触点来检查触点和接口对JV特性的影响,不同的n层和不同的i-layers.ag和Al顶部接触给未成年人极性之间的差异,而与Cr接触没有差异。I层中的缺陷层的缺陷层的掺入结果导致不对称的JV曲线。我们在实验装置中观察到一个小的不对称性,并且使用AMPS模型的大不对称性.Nin设备似乎是接口缺陷的敏感探头。

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