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Space-charge-limited currents in n-i-n devices ncorporating glow-discharge and hot-wire deposited a-Si:H

机译:结合辉光放电和热线沉积a-Si:H的n-i-n器件中的空间电荷限制电流

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Space-charge-limited currents have been examined in a wide variety of n-i-n devices.If the devices were completely symmetric, the current-voltage characteristics would be identical for positive and negative bias,but in several devices differences between the two polarities were observed.In order to understand in which part of the device these differences originate,the influence of the contacts and interfaces on the JV characteristics were examined by using different metla top contacts,different n-layersand different i-layers.Ag and AL top contacts gave minor differences between the polarities,whereas with Cr contacts no differences were observed.Incorporation of a defect layer in the i-layer results in asymmetric JV curves.We have observed a small asymmetry in an experimental device, and a large asymmetry using AMPS modeling.N-i-n devices appear to be a sensitive probe for interface defects.
机译:在各种各样的nin器件中已经检查了空间电荷限制电流。如果器件完全对称,则正负偏压的电流-电压特性将相同,但是在几个器件中观察到两种极性之间的差异。为了了解这些差异源自器件的哪一部分,通过使用不同的金属层顶部接触层,不同的n层和不同的i层来检查接触点和界面对JV特性的影响。极性之间存在差异,而与Cr接触则没有差异.i层中引入缺陷层会导致JV曲线不对称。我们观察到实验设备中的不对称性较小,而使用AMPS建模时则存在较大的不对称性。设备似乎是接口缺陷的敏感探测器。

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