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Orientation dependent growth of TmAs wires in GaAs grown by MBE

机译:由MBE生长的GaAs中TMA线的定位依赖生长

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Thulium doped gallium arsenide has been grown by Molecular Beam Epitaxy (MBE) on both (100), (311)B and (111)A oriented GaAs substrates. Above the solubility limit for Tm in GaAs, free precipitation of TmAs occurs and this can be either as dots, wires or bifurcated trees, depending on growth conditions. We show that the substrate orientation has a marked effect on the form of the precipitates and provides a means to control the microstructure of TmAs in its wire-like form.
机译:通过分子束外延(MBE)在(100),(311)B和(111)的定向GaAs底物上的分子束外延(MBE)生长掺杂镓砷化镓。高于GaAs中TM的溶解度限制,发生TM的自由沉淀,这可以是点,电线或分叉树,这取决于生长条件。我们表明衬底取向对沉淀物的形式具有标记的效果,并提供一种以其线状形式控制TMA的微观结构的方法。

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