首页> 外文会议>Indium Phosphide and Related Materials, 1997., International Conference on >Gas source MBE growth of TlInGaP and TlInGaAs as new materials for long-wavelength applications
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Gas source MBE growth of TlInGaP and TlInGaAs as new materials for long-wavelength applications

机译:TlInGaP和TlInGaAs气源MBE增长作为长波应用的新材料

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The gas source MBE grown layers exhibited (2/spl times/4) surface reconstruction. X-ray diffraction measurements showed the successful growth of TlInP, TlGaP, TlInGaP and TlInAs. No phase separation was observed in TlInP and TlInGaP grown on InP substrates and TlInAs on InAs, while phase separation was observed in TlGaP grown on GaAs. PL emission was observed for TllnP and TlInGaP grown on InP. The layers showed n-type conduction with an electron concentration of 6.3/spl times/10/sup 15/ (3.9/spl times/10/sup 15/) cm/sup -3/ and an electron mobility of 2,500 (22,000) cm/sup 2//V.s at room temperature (77 K) for TlInP with a Tl composition of 5%. Photocurrent versus wavelength measurements showed a decrease of band gap energy by the addition of Tl and that its temperature variation is smaller than that of InAs, indicating the possibility of temperature independent band gap energy in these alloy semiconductors.
机译:气源MBE生长层表现出(2 / SPL时/ 4)表面重建。 X射线衍射测量显示TLINP,TLGAP,Tlingap和Tlinas的成功生长。在TLINP和Tlingap在INP底物和TLINAS上观察到在INAS上的Tlingap中未观察到相分离,而在GaAs上生长的TLGAP中观察到相分离。观察到在INP上的TLLNP和Tlingap的PL发射。该层显示了N型传导,电子浓度为6.3 / SPL时间/ 10 / SOP 15 /(3.9 / SPL时/ 10 / SOP 15 /)CM / SUP -3 /和2,500(22,000)cm的电子迁移率/ sup 2 //在室温(77 k)的vs,用于Tlinp,T1组成为5%。光电流与波长测量结果通过添加T1表示带隙能量的降低,并且其温度变化小于INA的温度,表示这些合金半导体中温度无关的带隙能量的可能性。

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