首页> 外文会议>Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on >Cadmium sulfide surface stabilization and Schottky barrier enhancement for InP based optoelectronic devices
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Cadmium sulfide surface stabilization and Schottky barrier enhancement for InP based optoelectronic devices

机译:基于InP的光电器件的硫化镉表面稳定和肖特基势垒增强

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We have investigated the use of CdS interlayers grown by chemical bath deposition (CBD). We have deposited CdS on a wide variety of III-V semiconductors. We found that native oxides were reduced by the CdS treatment. CdS-treated and untreated HEMTs and metal-semiconductor-metal photodetectors (MSMs) were compared. Thin 50 /spl Aring/ layers were effective in reducing gate and surface leakage. The thin CdS layers reduced the gate leakage of InA1As/InGaAs HEMTs and the dark current of InA1As/InGaAs optical detectors. X-ray photoelectron spectroscopy indicates a reduction of surface oxides and the prevention of subsequent group III or V oxide formation. Backside processing of InGaAs/lnA1As MSMs allows complete coverage of the mesas. The CBD process for depositing CdS is inherently adaptable to a wide range of optoelectronic device processes.
机译:我们已经研究了通过化学浴沉积(CBD)生长的CdS夹层的使用。我们已经在各种III-V半导体上沉积了CdS。我们发现通过CdS处理可以还原天然氧化物。比较了经CdS处理和未经处理的HEMT和金属半导体金属光电探测器(MSM)。 50 spl Aring /薄层可有效减少浇口和表面泄漏。薄的CdS层减少了InA1As / InGaAs HEMT的栅极泄漏和InA1As / InGaAs光检测器的暗电流。 X射线光电子能谱表明减少了表面氧化物并防止了随后的III或V族氧化物的形成。 InGaAs / lnA1As MSM的背面处理可完全覆盖台面。沉积CdS的CBD工艺本质上适用于各种光电器件工艺。

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