首页> 外国专利> PHOTOVOLTAIQUE DETECTOR IN CADMIUM SULFIDE, SCHOTTKY BARRIER AND MANUFACTURING METHOD THEREOF.

PHOTOVOLTAIQUE DETECTOR IN CADMIUM SULFIDE, SCHOTTKY BARRIER AND MANUFACTURING METHOD THEREOF.

机译:硫化镉中的光伏检测器,肖特基势垒及其制造方法。

摘要

A platinum-cadmium sulfide Schottky barrier photovoltaic detector which is capable of sensing near ultraviolet and short wavelength visible radiation with extremely small response to wavelengths longer than about 5200 angstroms. The detector is fabricated with both the ohmic and barrier contacts located on the same side of the cadmium sulfide substrate to facilitate wire attachment by high-speed bonding techniques. A titanium-gold-titanium infrared shield structure is deposited directly on the substrate and is utilized to provide a connection between the ohmic contact and the substrate. An insulating layer of silicon dioxide covers the shield structure. A thin layer of platinum is deposited directly on the substrate in a small central optically active area surrounded by the insulated shield structure. A metal boundary layer overlies the periphery of the platinum layer and prevents the barrier contact metalization from affecting the properties of the Schottky barrier. Both the ohmic and barrier contacts may be formed of a titanium adhesive layer and a layer of gold. The gold portions of these contacts touch the shield structure and the boundary layer through separate windows etched in the silicon dioxide insulating layer.
机译:一种铂-镉硫化物肖特基势垒光电探测器,它能够感应近紫外光和短波长可见辐射,对波长长于约5200埃的响应极小。该检测器的欧姆接触和势垒接触均位于硫化镉基板的同一侧,以利于通过高速键合技术进行导线连接。钛金钛红外屏蔽结构直接沉积在基板上,并用于在欧姆接触和基板之间提供连接。二氧化硅绝缘层覆盖屏蔽结构。铂薄层直接沉积在基板上被绝缘屏蔽结构包围的较小的中央光学有效区域中。金属边界层覆盖铂层的外围并防止势垒接触金属化影响肖特基势垒的性能。欧姆接触和势垒接触都可以由钛粘合剂层和金层形成。这些触点的金部分通过在二氧化硅绝缘层中蚀刻的单独窗口接触屏蔽结构和边界层。

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