首页> 外文会议>Indium Phosphide and Related Materials, 1991., Third International Conference. >Preparation and characterization of polysulfide treated InP MIS structures
【24h】

Preparation and characterization of polysulfide treated InP MIS structures

机译:经多硫化物处理的InP MIS结构的制备与表征

获取原文

摘要

It is shown that InP treated with a polysulfide solution prepared by bubbling O/sub 2/ through ammonium sulfide with excess sulfur dissolved results in excellent interfaces, whereas polysulfide-free solutions have little effect. Interface state densities of 10/sup 10/ cm/sup -2/ eV/sup -1/ as judged by quasi-static CV measurements were obtained on polysulfide treated MIS structures coated with IPCVD SiO/sub 2/. Low temperature PL spectra show marked difference on polysulfide treated InP when compared to InP that was treated with commercially available ammonium sulfide. Low temperature gated PL spectra, measured using a semi-transparent gate MIS structure as a function of gate bias, show easier band bending for polysulfide passivated InP. Raman studies indicate smaller depletion widths and lower barrier heights due to lower interface states on such treated samples.
机译:结果表明,用通过将O / sub 2 /通过硫化铵鼓泡并溶解有过量硫的多硫化物溶液处理的InP产生了优异的界面,而无多硫化物的溶液几乎没有作用。通过准静态CV测量判断,在涂有IPCVD SiO / sub 2 /的多硫化物处理的MIS结构上获得的界面态密度为10 / sup 10 / cm / sup -2 / eV / sup -1 /。与用市售硫化铵处理过的InP相比,低温PL光谱在经多硫化物处理过的InP上显示出显着差异。使用半透明栅极MIS结构作为栅极偏置的函数进行测量的低温门控PL光谱显示,多硫化物钝化InP的带弯曲更容易。拉曼研究表明,由于此类处理样品的界面状态较低,因此耗尽层宽度较小,势垒高度较低。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号