首页> 外文会议>Indium Phosphide and Related Materials, 1991., Third International Conference. >Optical characterization of strained III-V compound semiconductor epilayers
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Optical characterization of strained III-V compound semiconductor epilayers

机译:应变III-V化合物半导体外延层的光学表征

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A technique using photoluminescence spectroscopy (PL) to optically characterize the strain present in a lattice mismatched III-V compound semiconductor bulk epilayer is described. The 15-K PL spectra of a series of In/sub x/Ga/sub 1-x/As epilayers with indium compositions at or slightly above that needed to satisfy the lattice matching condition are presented. At the exact lattice matching condition, a single, narrow, strong PL peak is observed. As the indium composition is increased further, the lattice constant increases, and the epilayer experiences biaxial compressive strain. A doublet structure evolves in the PL spectrum, and only a weak, single, broad, PL peak is observed when the whole epilayer has relaxed. The analysis is non-destructive, rapid, and applicable to any epilayer in which strain may be present.
机译:描述了一种使用光致发光光谱(PL)来光学表征存在于晶格失配的III-V化合物半导体体外延层中的应变的技术。呈现了一系列In / sub x / Ga / sub 1-x / As外延层的15-K PL光谱,铟层的组成等于或略高于满足晶格匹配条件所需的铟组成。在精确的晶格匹配条件下,观察到一个狭窄的强PL峰。随着铟成分的进一步增加,晶格常数增加,并且外延层经历双轴压缩应变。在PL光谱中会形成双峰结构,并且当整个外延层松弛时,只能观察到一个弱,单一,宽的PL峰。该分析是非破坏性的,快速的,并且适用于可能存在应变的任何外延层。

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