首页> 外文会议>Indium Phosphide and Related Materials, 1991., Third International Conference. >High precision characterization in In/sub x/Ga/sub 1-x/As on InP
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High precision characterization in In/sub x/Ga/sub 1-x/As on InP

机译:InP上In / sub x / Ga / sub 1-x / As的高精度表征

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Results of Fourier transform photoluminescence (FTPL), X-ray diffraction (XRD), micro-Raman spectroscopy, and photoreflectance (PR) nondestructive characterization measurements of In/sub x/Ga/sub 1-x/As grown by molecular beam epitaxy (MBE) on semi-insulating InP:Fe substates are presented. FTPL identified recombination processes at low and room temperature and carrier types of InGaAs films through correlation of 4.2 K and 293 K PL emissions. XRD measurements determine the extent of film relaxation and the composition. The strained nature of the InGaAs films is suggested by the correlation of low temperature PL bandgap energy and XRD composition. GaAs-like LO and TO modes and an InAs-like LO mode are identified by Raman scattering. Room temperature PR and PL bandgap energies show correlation within experimental error.
机译:分子束外延生长的In / sub x / Ga / sub 1-x / As的傅立叶变换光致发光(FTPL),X射线衍射(XRD),显微拉曼光谱和光反射(PR)无损表征测量结果(提出了关于半绝缘InP:Fe子态的MBE)。 FTPL通过关联4.2 K和293 K PL发射确定了InGaAs薄膜在低温和室温下的重组过程以及载流子类型。 XRD测量确定膜松弛程度和组成。 InGaAs薄膜的应变性质由低温PL带隙能量和XRD组成的相关性暗示。通过拉曼散射识别类似GaAs的LO和TO模式以及类似InAs的LO模式。室温PR和PL带隙能量在实验误差范围内显示出相关性。

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