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PROCESS FOR PRODUCTION OF AlxGa(1-X)N SINGLE CRYSTAL, AlxGa(1-X)N SINGLE CRYSTAL, AND OPTICS

机译:生产AlxGa(1-X)N单晶,AlxGa(1-X)N单晶和光学的过程

摘要

A method of producing an AlxGa(1-x)N (0 x ≤ 1) single crystal (10) is directed to growing an AlxGa(1-x)N single crystal (10) by sublimation. The method includes the steps of preparing an underlying substrate having a composition ratio x identical to the composition ratio of the AlxGa(1-x)N single crystal, preparing a raw material of high purity, and growing an AlxGa(1-x)N single crystal (10) on the underlying substrate by sublimating the raw material. The AlxGa(1-x)N single crystal (10) has an absorption coefficient less than or equal to 100 cm-1 with respect to light at a wavelength greater than or equal to 250 nm and less than 300 nm, and an absorption coefficient less than or equal to 21 cm-1 with respect to light at a wavelength greater than or equal to 300 nm and less than 350 nm.
机译:生产AlxGa(1-x)N(0 <x≤1)单晶(10)的方法涉及通过升华生长AlxGa(1-x)N单晶(10)。该方法包括以下步骤:制备具有与AlxGa(1-x)N单晶的组成比相同的组成比x的下层基板;制备高纯度的原材料;以及生长AlxGa(1-x)N通过升华原料在下层基板上形成单晶(10)。 AlxGa(1-x)N单晶(10)对于波长大于或等于250nm且小于300nm的光具有小于或等于100cm-1的吸收系数,以及吸收系数相对于波长大于或等于300 nm且小于350 nm的光小于或等于21 cm-1。

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