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PROCESS FOR PRODUCTION OF AlXGa(1-X)N SINGLE CRYSTAL, AlXGa(1-X)N SINGLE CRYSTAL, AND OPTICS

机译:AlXGa(1-X)N单晶,AlXGa(1-X)N单晶和光学的制造工序

摘要

A process for the production of an AlXGa(1-X)N single crystal (10) (wherein 0x≤1) by growing an AlXGa(1-X)N single crystal by a sublimation method, which comprises the step of preparing a substrate having the same compositional ratio (x) as that of the AlXGa(1-X)N single crystal, the step of preparing a high-purity raw material, and the step of sublimating the raw material to grow an AlXGa(1-X)N single crystal on the substrate.  The AlXGa(1-X)N single crystal (10) exhibits an absorption coefficient of 100cm-1 or below for a light having a wavelength of 250nm to shorter than 300nm and an absorption coefficient of 21cm-1 or below for a light having a wavelength of 300nm to shorter than 350nm, each absorption coefficient being determined at 300K.
机译:通过升华法生长AlXGa(1-X)N单晶来制造AlXGa(1-X)N单晶(10)(0 <x≤1)的方法,该方法包括以下步骤:具有与AlXGa(1-X)N单晶相同的组成比(x)的基板,制备高纯度原材料的步骤以及使原材料升华以生长AlXGa(1-)的步骤X)N单晶在基板上。 AlXGa(1-X)N单晶(10)对于波长为250nm至小于300nm的光表现出100cm-1以下的吸收系数,对于波长为300nm的光表现出21cm-1以下的吸收系数。波长为300nm至小于350nm,每个吸收系数确定为300K。

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