首页> 外文会议>Indium Phosphide and Related Materials, 1991., Third International Conference. >Growth of low dislocation density InP single crystals by the phosphorus vapor controlled LEC method
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Growth of low dislocation density InP single crystals by the phosphorus vapor controlled LEC method

机译:磷蒸气控制LEC方法生长低位错密度InP单晶

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The growth of 3-in S-doped and Fe-doped and 2-in Sn-doped InP single crystals with reduced axial temperature gradients using the phosphorus vapor controlled liquid encapsulation Czochralski (PC-LEC) method is discussed. It is shown that, in the case of S-doped crystals, the dislocation-free area of the crystal is increased using the PC-LEC method, compared to that of crystals grown using the conventional LEC method. It is also shown that 3-in Fe-doped InP could be grown with a dislocation density lower than 10/sup 4/ cm/sup -2/. The average EPD was lower than 5*10/sup 3/ cm/sup -2/ in 2-in Sn-doped InP. The photoluminescence intensity of PC-LEC crystals was much higher than that of conventional LEC crystals in the case of Sn-doped InP.
机译:讨论了使用磷蒸气控制的液体封装切克劳斯基(PC-LEC)方法生长具有降低的轴向温度梯度的3 in S掺杂,Fe掺杂和2 in Sn掺杂的InP单晶。结果表明,与使用传统LEC方法生长的晶体相比,在使用S掺杂晶体的情况下,使用PC-LEC方法增加了晶体的无位错面积。还显示出可以以低于10 / sup 4 / cm / sup -2 /的位错密度生长3英寸铁掺杂的InP。在2英寸掺锡InP中,平均EPD低于5 * 10 / sup 3 / cm / sup -2 /。在掺锡InP的情况下,PC-LEC晶体的光致发光强度远高于常规LEC晶体。

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