首页> 外文会议>Indium Phosphide and Related Materials, 1991., Third International Conference. >Analysis of DBE grown GaInAsP/InP heterostructures for 1.55 mu m lasers
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Analysis of DBE grown GaInAsP/InP heterostructures for 1.55 mu m lasers

机译:DBE生长的1.55μm激光器的GaInAsP / InP异质结构分析

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The quality of GaInAsP/InP heterostructures grown by chemical beam epitaxy is analyzed using the light-current characteristics of board area lasers. The optical scattering linear coefficient ( alpha s) and the effective radiative coefficient (B/sub eff/) are calculates from the comparison of experimental data with a theoretical model. The low value of alpha s (9 cm/sup -1/) indicated a low roughness of the interfaces. The value of B/sub eff/ is found to be comparable with those obtained for heterostructures grown with other techniques.
机译:利用板面积激光器的光电流特性分析了化学束外延生长的GaInAsP / InP异质结构的质量。通过将实验数据与理论模型进行比较,计算出光散射线性系数(αs)和有效辐射系数(B / sub eff /)。 alpha s的低值(9 cm / sup -1 /)表明界面的粗糙度低。发现B / sub eff /的值与采用其他技术生长的异质结构的值相当。

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