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Study of Electron Drift Mobility in Nitrides Indium and Gallium

机译:氮化物铟和镓中电子漂移迁移率的研究

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For indium and gallium nitrides, momentum scattering rates were calculated and analyzed for typical types of impurity and phonon mechanisms. For the first time, a weak-field temperature dependence of the electron drift mobility was calculated for indium and gallium nitrides in a wide range of dopant concentrations. The results of modeling were verified. Initial parameters are proposed for modeling the transport properties of electrons in a weak electric field mode. The field-velocity characteristics were simulated by the relaxation equation method.
机译:对于铟和镓的氮化物,计算并分析了典型类型的杂质和声子机理的动量散射率。首次计算出在宽范围的掺杂剂浓度下,铟和氮化镓的电子漂移迁移率对弱场温度的依赖性。建模结果得到了验证。提出了用于在弱电场模式下对电子的传输特性进行建模的初始参数。用弛豫方程法模拟了场速度特性。

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