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Residual Stress Characterisation of Thin Sputtered Copper Films on Silicon Exploiting Membrane Resonance within a Specimen Centred Approach

机译:样品中心内硅薄膜上铜膜上的溅射铜膜的残余应力表征

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摘要

Thin metal layers, especially those made of copper, are omnipresent in today’s packaging applications as e.g. RDL structures, conductor traces on flexible and stretchable substrates, chip finishes or terminal metallisation, serving electrical, thermal or
机译:薄金属层,特别是铜制成的薄金属层,在当今的包装应用中已不存在,例如RDL结构,柔性和可拉伸基板上的导体走线,芯片表面处理或终端金属化,可用于电气,热或电

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